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Wednesday, August 10, 2016
Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing
ACS Nano
DOI: 10.1021/acsnano.6b03667
from ACS Nano: Latest Articles (ACS Publications) http://ift.tt/2aMzJlm
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