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Friday, January 27, 2017
Lithography-Free Miniaturization of Resistive Nonvolatile Memory Devices to the 100 nm Scale by Glancing Angle Deposition
Nano Letters
DOI: 10.1021/acs.nanolett.6b04794
from Nano Letters: Latest Articles (ACS Publications) http://ift.tt/2kaXtVk
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