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Friday, February 09, 2018
Scalable Top-Down Approach Tailored by Interferometric Lithography to Achieve Large-Area Single-Mode GaN Nanowire Laser Arrays on Sapphire Substrate
ACS Nano
DOI: 10.1021/acsnano.7b07653
from ACS Nano: Latest Articles (ACS Publications) http://ift.tt/2ERZE8z
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