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Monday, June 11, 2018
[ASAP] Enhanced Performance of Ge Photodiodes Monolithic Antireflection Texturing and a-Ge Self-Passivation by Inverse Metal-Assisted Chemical Etching
ACS Nano
DOI: 10.1021/acsnano.8b01848
from ACS Nano: Latest Articles (ACS Publications) https://ift.tt/2l4izEg
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