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Monday, April 15, 2019
[ASAP] Effect of HF Pressure on Thermal Al2O3 Atomic Layer Etch Rates and Al2O3 Fluorination
The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.9b00124
from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://bit.ly/2IkAwfj
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