Thursday, February 14, 2013

Two-surface-plasmon-polariton-absorption based nanolithography

(author unknown)



Yunxiang Li, Fang Liu, and Long Xiao et al.

We propose and demonstrate the two-surface-plasmon-polariton-absorption (TSPPA), which is a nonlinear effect by absorbing two surface-plasmon-polaritons (SPPs), as well as a nanolithography technique based on TSPPA. The TSPPA effect is verified with the plasmonic interference structure to exclude ... [Appl. Phys. Lett. 102, 063113 (2013)] published Thu Feb 14, 2013.



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