Nanoscale , 2015, Advance Article
DOI: 10.1039/C4NR07080A, Paper
DOI: 10.1039/C4NR07080A, Paper
V. Kranthi Kumar, Sukanya Dhar, Tanushree H. Choudhury, S. A. Shivashankar, Srinivasan Raghavan
A generic approach suitable to all TMDs has been demonstrated. Thermodynamic modeling identifies the appropriate CVD process window and the growth is controlled by tuning the vapor phase supersaturation. Consequently MoS2 growth, bulk to monolayers, has been achieved.
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A generic approach suitable to all TMDs has been demonstrated. Thermodynamic modeling identifies the appropriate CVD process window and the growth is controlled by tuning the vapor phase supersaturation. Consequently MoS2 growth, bulk to monolayers, has been achieved.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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