Nanochemistry
Where size matters
Pages
Home
Donations
Contact Me
Monday, July 22, 2013
Different Crystal Growth Mechanisms of Si(001)-(2 × 1):H during Plasma-Enhanced Chemical Vapor Deposition of SiH3 and SiH2 Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations
The Journal of Physical Chemistry C
DOI: 10.1021/jp4021504
Takuya Kuwahara, Hiroshi Ito, Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa and Momoji Kubo
Click for full article
No comments:
Post a Comment
Newer Post
Older Post
Home
View mobile version
Subscribe to:
Post Comments (Atom)
No comments:
Post a Comment