Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide

Chemistry of Materials

DOI: 10.1021/cm4031057

Xiangbo Meng, Joseph A. Libera, Timothy T. Fister, Hua Zhou, Jenny K. Hedlund, Paul Fenter and Jeffrey W. Elam

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