Wednesday, October 29, 2014

Atomically Engineered Metal–Insulator Transition at the TiO2/LaAlO3 Heterointerface

TOC Graphic


Nano Letters

DOI: 10.1021/nl5039192




Makoto Minohara, Takashi Tachikawa, Yasuo Nakanishi, Yasuyuki Hikita, Lena F. Kourkoutis, Jun-Sik Lee, Chi-Chang Kao, Masahiro Yoshita, Hidefumi Akiyama, Christopher Bell and Harold Y. Hwang

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