Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

Julia D. Cushen, Issei Otsuka, Christopher M. Bates, Sami Halila, Sébastien Fort, Cyrille Rochas, Jeffrey A. Easley, Erica L. Rausch, Anthony Thio, Redouane Borsali, C. Grant Willson and Christopher J. Ellison Link to full article

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