Direct nanoimprint lithography of Al 2 O 3 using a chelated monomer-based precursor

Ramakrishnan Ganesan, Saman Safari Dinachali, Su Hui Lim, M S M Saifullah, Wee Tit Chong, Andrew H H Lim, Jin Jie Yong, Eng San Thian, Chaobin He and Hong Yee Low Link to full article

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