Friday, October 12, 2012

In Situ Reaction Mechanism Studies on Atomic Layer Deposition of AlxSiyOz from Trimethylaluminium, Hexakis(ethylamino)disilane, and Water

Yoann Tomczak, Kjell Knapas, Suvi Haukka, Marianna Kemell, Mikko Heikkilä, Marcel Ceccato, Markku Leskelä and Mikko Ritala



TOC Graphic


Chemistry of Materials

DOI: 10.1021/cm301658m






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