Thursday, October 29, 2015

Interface Schottky barrier engineering via strain in metal-semiconductor composites

Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR05583K, Paper
Xiangchao Ma, Ying Dai, Lin Yu, Baibiao Huang
We show that strain can be an effective way to tune the interface Schottky barrier height in metal-semiconductor composites.
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