Friday, July 08, 2016

Bromine as a Preferred Etchant for Si Surfaces in the Supersaturation Regime: Insights from Calculations of Atomic Scale Reaction Pathways

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b04450


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/29nXvSe
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