Friday, September 16, 2016

Trimethylboron as Single-Source Precursor for Boron–Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b06529


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/2cfk9kK
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