Friday, January 27, 2017

Lithography-Free Miniaturization of Resistive Nonvolatile Memory Devices to the 100 nm Scale by Glancing Angle Deposition

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Nano Letters
DOI: 10.1021/acs.nanolett.6b04794


from Nano Letters: Latest Articles (ACS Publications) http://ift.tt/2kaXtVk
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