Tuesday, May 02, 2017

Controlled Growth, Microstructure, and Properties of Functional Si Quantum Dot Films via Plasma Chemistry and Activated Radicals

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.7b02430


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/2qpWrbJ
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