Thursday, August 23, 2018

[ASAP] First Principles Investigation of HCl, H2, and Chlorosilane Adsorption on Cu3Si Surfaces with Applications for Polysilicon Production

TOC Graphic

The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.8b04460


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2w5zXyg
via IFTTT
Posted by at

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)