Thursday, September 20, 2018

[ASAP] Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.8b06342


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2QMZTYn
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