Wednesday, October 30, 2019

[ASAP] Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.9b08176


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2NppCFk
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