Thursday, December 19, 2019

[ASAP] Nanopatterning of Cu-Ligated Mercaptoalkanoic Acid Multilayers on Si Substrates via Atomic Force Lithography

TOC Graphic

The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.9b10364


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2sHg1Dd
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