Wednesday, January 29, 2020

[ASAP] Atomic Layer Deposition of Al2O3 Using Trimethylaluminum and H2O: The Kinetics of the H2O Half-Cycle

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.9b11291


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2t4dseK
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