Friday, November 20, 2020

[ASAP] A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.0c07602


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/2UM1HE0
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