Friday, March 26, 2021

[ASAP] Molecular Mechanism of Thermal Dry Etching of Iron in a Two-Step Atomic Layer Etching Process: Chlorination Followed by Exposure to Acetylacetone

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.0c10556


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/3rupDK2
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