Tuesday, October 19, 2021

[ASAP] Atomic Force Microscopy-Based Static Plowing Lithography Using CaCO3 Nanoparticle Resist Layers as a Substrate-Flexible Selective Metal Deposition Resist

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.1c07239


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/3DVl6H4
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