Tuesday, October 05, 2021

[ASAP] Thermal Chemistry of Nickel Diketonate Atomic Layer Deposition (ALD) Precursors on Tantalum and Silicon Oxide Surfaces

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.1c07071


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/3D3MPVM
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