Saturday, November 13, 2021

[ASAP] Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO2

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.1c08110


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) https://ift.tt/3wGUwPy
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