Showing posts with label October 26. Show all posts
Showing posts with label October 26. Show all posts

Monday, October 26, 2015

Peptide Self-Assembled Biofilm with Unique Electron Transfer Flexibility for Highly Efficient Visible-Light-Driven Photocatalysis

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ACS Nano
DOI: 10.1021/acsnano.5b04884

Yun-Xiang Pan, Huai-Ping Cong, Yu-Long Men, Sen Xin, Zheng-Qing Sun, Chang-Jun Liu and Shu-Hong Yu
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Ferroelectric Single-Crystal Gated Graphene/Hexagonal-BN/Ferroelectric Field-Effect Transistor

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ACS Nano
DOI: 10.1021/acsnano.5b04339

Nahee Park, Haeyong Kang, Jeongmin Park, Yourack Lee, Yoojoo Yun, Jeong-Ho Lee, Sang-Goo Lee, Young Hee Lee and Dongseok Suh
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Soft Patchy Particles of Block Copolymers from Interface-Engineered Emulsions

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ACS Nano
DOI: 10.1021/acsnano.5b05058

Kang Hee Ku, YongJoo Kim, Gi-Ra Yi, Yeon Sik Jung and Bumjoon J. Kim
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Vault Nanoparticles Packaged with Enzymes as an Efficient Pollutant Biodegradation Technology

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ACS Nano
DOI: 10.1021/acsnano.5b04073

Meng Wang, Danny Abad, Valerie A. Kickhoefer, Leonard H. Rome and Shaily Mahendra
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Methane Activation on Zn2+-Exchanged ZSM-5 Zeolites. The Effect of Molecular Oxygen Addition

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b08759

Anton A. Gabrienko, Sergei S. Arzumanov, Mikhail V. Luzgin, Alexander G. Stepanov and Valentin N. Parmon
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Absorption Spectroscopy of Single Optically Trapped Gold Nanorods

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Nano Letters
DOI: 10.1021/acs.nanolett.5b03833

Zhongming Li, Weizhi Mao, Mary Sajini Devadas and Gregory V. Hartland
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Effect of Electric Bias on the Deposition Behavior of ZnO Nanostructures in the Chemical Vapor Deposition Process

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b06796

Seong-Han Park, Jin-Woo Park, Seung-Min Yang, Kwang-Ho Kim and Nong-Moon Hwang
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CO Adsorption on Pt Nanoparticles in Low E-Fields Studied by ATR-IR Spectroscopy in a Microreactor

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b08392

A. Susarrey-Arce, R. M. Tiggelaar, J. G. E. Gardeniers, A. van Houselt and L. Lefferts
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Atomistic Modeling of Sulfur Vacancy Diffusion Near Iron Pyrite Surfaces

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b08300

Y. N. Zhang, M. Law and R. Q. Wu
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Long-Range Order Induced by Intrinsic Repulsion on an Insulating Substrate

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b08829

Julia L. Neff, Hagen Söngen, Ralf Bechstein, Philipp Maass and Angelika Kühnle
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Crystalline Matrix of Mesoporous TiO2 Framework for Dye-Sensitized Solar Cell Application

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b08639

Chang Woo Kim, Mi Jin Choi, Seungyoon Lee, Hyoungsook Park, Bongjin Moon, Yong Soo Kang and Young Soo Kang
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Strain-Induced Spatial and Spectral Isolation of Quantum Emitters in Mono- and Bilayer WSe2

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Nano Letters
DOI: 10.1021/acs.nanolett.5b03312

S. Kumar, A. Kaczmarczyk and B. D. Gerardot
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Chemisorbed Sulfate-Driven Oscillatory Electro-Oxidation of Thiourea on Gold

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b07552

You Jia, Yuemin Zhao, Yuxiu He, Changwei Pan, Chen Ji, Wenyan Bi and Qingyu Gao
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Band Bending Inversion in Bi2Se3 Nanostructures

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Nano Letters
DOI: 10.1021/acs.nanolett.5b03124

Louis Veyrat, Fabrice Iacovella, Joseph Dufouleur, Christian Nowka, Hannes Funke, Ming Yang, Walter Escoffier, Michel Goiran, Barbara Eichler, Oliver G. Schmidt, Bernd Büchner, Silke Hampel and Romain Giraud
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Carrier Mobility Enhancement of Tensile Strained Si and SiGe Nanowires via Surface Defect Engineering

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Nano Letters
DOI: 10.1021/acs.nanolett.5b01634

J. W. Ma, W. J. Lee, J. M. Bae, K. S. Jeong, S. H. Oh, J. H. Kim, S.-H. Kim, J.-H. Seo, J.-P. Ahn, H. Kim and M.-H. Cho
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Seedless Growth of Palladium Nanocrystals with Tunable Structures: From Tetrahedra to Nanosheets

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Nano Letters
DOI: 10.1021/acs.nanolett.5b04019

Ying Zhang, Mingsong Wang, Enbo Zhu, Yuebing Zheng, Yu Huang and Xiaoqing Huang
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Oxidation Mechanism of Aluminum Nanopowders

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.5b07321

Marie-Vanessa Coulet, Benoit Rufino, Pierre-Henry Esposito, Thomas Neisius, Olivier Isnard and Renaud Denoyel
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