Wednesday, March 28, 2012

Patterning-induced strain relief in single lithographic SiGe nanostructures studied by nanobeam=0Ax-ray diffraction

D Chrastina, G M Vanacore, M Bollani, P Boye, S Schöder, M Burghammer, R Sordan, G Isella, M Zani and A Tagliaferri



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