Thursday, October 25, 2012

Robust, High-Density Zinc Oxide Nanoarrays by Nanoimprint Lithography-Assisted Area-Selective Atomic Layer Deposition

Vignesh Suresh, Meiyu Stella Huang, M. P. Srinivasan, Cao Guan, Hong Jin Fan and Sivashankar Krishnamoorthy



TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp307152s






Link to full article
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