Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

Chemistry of Materials

DOI: 10.1021/cm402422e

Sophie L. Benjamin, C. H. (Kees) de Groot, Chitra Gurnani, Andrew L. Hector, Ruomeng Huang, Konstantin Ignatyev, William Levason, Stuart J. Pearce, Fiona Thomas and Gillian Reid

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