Tuesday, November 12, 2013

Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor

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Chemistry of Materials

DOI: 10.1021/cm402974j




Y. Wu, S. E. Potts, P. M. Hermkens, H. C. M. Knoops, F. Roozeboom and W. M. M. Kessels

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