Silicon nanowires (SiNWs) have long been considered a promising material due to their extraordinary electrical and optical properties. As a simple, highly efficient fabrication method for SiNWs, metal-assisted chemical etching (MACE) has been intensively studied over recent years. However, effective control by modulation of simple parameters is still a challenging topic and some key questions still remain in the mechanistic processes. In this work, a novel method to manipulate SiNWs with a light-modulated MACE process has been systematically investigated. Conic structures consisting of inclined and clustered SiNWs can be generated and effectively modified by the incident light while new patterns such as ‘bamboo shoot’ arrays can also be formed under certain conditions. More importantly, detailed study has revealed a new top-down ‘diverting etching’ model of the conic structures in this process, different from the previously proposed ‘bending’ model. As a consequence of this mecha...
Shenli Zhang, Xinwei Wang, Hong Liu and Wenzhong Shen
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Shenli Zhang, Xinwei Wang, Hong Liu and Wenzhong Shen
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