Tuesday, December 03, 2013

Direct modification of colloidal hole-masks for locally ordered hetero-assemblies of nanostructures over large areas




Nanoscale , 2014, Advance Article

DOI: 10.1039/C3NR03871H, Communication

Maj Frederiksen, Duncan S. Sutherland

We develop an add-on technique to radically enhance hole-mask colloidal lithography allowing selection of arbitrary sizes of multiple structures.

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