Nanoscale , 2014, Advance Article
DOI: 10.1039/C3NR03871H, Communication
DOI: 10.1039/C3NR03871H, Communication
Maj Frederiksen, Duncan S. Sutherland
We develop an add-on technique to radically enhance hole-mask colloidal lithography allowing selection of arbitrary sizes of multiple structures.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
We develop an add-on technique to radically enhance hole-mask colloidal lithography allowing selection of arbitrary sizes of multiple structures.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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