Nanoscale , 2014, Advance Article
DOI: 10.1039/C3NR05181A, Paper
DOI: 10.1039/C3NR05181A, Paper
Chuang Yue, Yingjian Yu, ZhenGuo Wu, Xu He, JianYuan Wang, JunTao Li, Cheng Li, Suntao Wu, Jing Li, Junyong Kang
Single crystalline Ge nano-islands embedded in wafer scale 3D hexagonal bottle-like Si NR arrays were fabricated by the NSL method combined with ICP dry etching and subsequent UHVCVD growth.
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Single crystalline Ge nano-islands embedded in wafer scale 3D hexagonal bottle-like Si NR arrays were fabricated by the NSL method combined with ICP dry etching and subsequent UHVCVD growth.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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