Thursday, January 30, 2014

Ultrathin Chemical Vapor Deposition (CVD)-Grown Hexagonal Boron Nitride as a High-Quality Dielectric for Tunneling Devices on Rigid and Flexible Substrates

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The Journal of Physical Chemistry C

DOI: 10.1021/jp410874z




Carlo M. Orofeo, Satoru Suzuki and Hiroki Hibino

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