Tuesday, March 04, 2014

Decomposition of Metal Alkylamides, Alkyls, and Halides at Reducible Oxide Surfaces: Mechanism of ‘Clean-up’ During Atomic Layer Deposition of Dielectrics onto III–V Substrates

TOC Graphic


Chemistry of Materials

DOI: 10.1021/cm403336c




Sylwia Klejna and Simon D. Elliott

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