Thursday, March 13, 2014

Extended Defects Formation in Nanosecond Laser-Annealed Ion Implanted Silicon

TOC Graphic


Nano Letters

DOI: 10.1021/nl4042438




Yang Qiu, Fuccio Cristiano, Karim Huet, Fulvio Mazzamuto, Giuseppe Fisicaro, Antonino La Magna, Maurice Quillec, Nikolay Cherkashin, Huiyuan Wang, Sébastien Duguay and Didier Blavette

Click for full article

No comments:

Post a Comment