Tuesday, March 25, 2014

Mechanistic Characteristics of Metal-Assisted Chemical Etching in GaAs

TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp500968p




Ho-Yuen Cheung, Hao Lin, Fei Xiu, Fengyun Wang, SenPo Yip, Johnny C. Ho and Chun-Yuen Wong

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