Nanoscale , 2014, Accepted Manuscript
DOI: 10.1039/C4NR01954G, Review Article
DOI: 10.1039/C4NR01954G, Review Article
Adriaan Jacobus Martinus Mackus, Ageeth A. Bol, Erwin Kessels
Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with atomic level control of the thickness and an excellent conformality on 3-dimensional surfaces. In...
The content of this RSS Feed (c) The Royal Society of Chemistry
Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with atomic level control of the thickness and an excellent conformality on 3-dimensional surfaces. In...
The content of this RSS Feed (c) The Royal Society of Chemistry
Click for full article
No comments:
Post a Comment