Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR03288A, Paper
DOI: 10.1039/C5NR03288A, Paper
G. Casano, F. Poulhes, T. K. Tran, M. M. Ayhan, H. Karoui, D. Siri, A. Gaudel-Siri, A. Rockenbauer, G. Jeschke, D. Bardelang, P. Tordo, O. Ouari
A mononitroxide designed to be fully included in cucurbit[n]uril (n = 7,8) shows high resistance toward reduction by ascorbate and unexpected faster rotation upon inclusion.
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A mononitroxide designed to be fully included in cucurbit[n]uril (n = 7,8) shows high resistance toward reduction by ascorbate and unexpected faster rotation upon inclusion.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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