Nanoscale, 2015, Advance Article
DOI: 10.1039/C5NR06815K, Communication
DOI: 10.1039/C5NR06815K, Communication
Tao Li, Zhongli Wang, Lars Schulte, Sokol Ndoni
Sub-20 nm block copolymer films directly applied on substrates and annealed in vapors of selective solvents significantly simplify the lithographic process.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Sub-20 nm block copolymer films directly applied on substrates and annealed in vapors of selective solvents significantly simplify the lithographic process.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
Click for full article
No comments:
Post a Comment