Chemistry of Materials
DOI: 10.1021/acs.chemmater.5b03691
Arijit Koley, Christopher T. O’Donohue, Michelle M. Nolan, K. Randall McClain, Richard O. Bonsu, Roman Y. Korotkov, Tim Anderson and Lisa McElwee-White
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Monday, November 30, 2015
Effect of the Ligand Structure on Chemical Vapor Deposition of WNxCy Thin Films from Tungsten Nitrido Complexes of the Type WN(NR2)3
Arijit Koley, Christopher T. O’Donohue, Michelle M. Nolan, K. Randall McClain, Richard O. Bonsu, Roman Y. Korotkov, Tim Anderson and Lisa McElwee-White
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