Thursday, May 12, 2016

Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone

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The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b01803


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/1TJ2XgJ
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