Thursday, June 23, 2016

Thermal Decomposition of Copper Iminopyrrolidinate Atomic Layer Deposition (ALD) Precursors on Silicon Oxide Surfaces

TOC Graphic

The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b03818


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/28UbnYd
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