Nanoscale , 2015, Accepted Manuscript
DOI: 10.1039/C4NR07679F, Paper
DOI: 10.1039/C4NR07679F, Paper
Cian Cummins, Anushka Gangnaik, Roisin Ann Kelly, Dipu Borah, John O'Connell, Nikolay Petkov, Yordan Georgiev, Justin D. Holmes, M A Morris
'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between...
The content of this RSS Feed (c) The Royal Society of Chemistry
'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between...
The content of this RSS Feed (c) The Royal Society of Chemistry
Click for full article
No comments:
Post a Comment