Nanoscale , 2013, Advance Article
DOI: 10.1039/C3NR04379G, Paper
DOI: 10.1039/C3NR04379G, Paper
Hu Zhou, Jiacheng Wang, Jiandong Zhuang, Qian Liu
In situ polymerized CMK-3/poly(methyl methacrylate) exhibits a reflection loss of -27 dB in the X-band, superior to that (-10 dB) prepared by solvent mixing.
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In situ polymerized CMK-3/poly(methyl methacrylate) exhibits a reflection loss of -27 dB in the X-band, superior to that (-10 dB) prepared by solvent mixing.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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