HfO2 on MoS2 by Atomic Layer Deposition: Adsorption Mechanisms and Thickness Scalability
ACS Nano
DOI: 10.1021/nn404775u
Stephen McDonnell, Barry Brennan, Angelica Azcatl, Ning Lu, Hong Dong, Creighton Buie, Jiyoung Kim, Christopher L. Hinkle, Moon J. Kim and Robert M. Wallace
No comments:
Post a Comment