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Tuesday, January 14, 2014
Silicon Monomer Formation and Surface Patterning of Si(001)-2 × 1 Following Tetraethoxysilane Dissociative Adsorption at Room Temperature
The Journal of Physical Chemistry C
DOI: 10.1021/jp407411k
Héloise Tissot, Jean-Jacques Gallet, Fabrice Bournel, Ahmed Naitabdi, Debora Pierucci, Federica Bondino, Elena Magnano, François Rochet and Fabio Finocchi
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